Low temperature plasma enhanced chemical vapour deposition boron nitride
M.N.P Carreño, J.P Bottecchia, I PereyraVolume:
308-309
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(97)00389-1
File:
PDF, 159 KB
english, 1997