Surface relaxation during plasma chemical vapor deposition...

Surface relaxation during plasma chemical vapor deposition of diamond-like carbon films, investigated by in-situ ellipsometry

A von Keudell, T Schwarz-Selinger, W Jacob
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Volume:
308-309
Year:
1997
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(97)00423-9
File:
PDF, 146 KB
english, 1997
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