Effect of partial pressure on the internal stress and the crystallographic structure of r.f. reactive sputtered Ti-N films
Shozo Inoue, Takaaki Ohba, Hironori Takata, Keiji KoterazawaVolume:
343-344
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(98)01632-0
File:
PDF, 343 KB
english, 1999