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Hydrofluoric acid etching of ultra thin silicon oxide film fabricated by high purity ozone
Ken Nakamura, Akira Kurokawa, Shingo IchimuraVolume:
343-344
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(98)01658-7
File:
PDF, 375 KB
english, 1999