Structure and adhesive properties of TiN films reactively...

Thin Solid Films 1999 Vol. 343-344; Iss. none

Structure and adhesive properties of TiN films reactively deposited by plasma-free sputtering

Takakazu Takahashi, Katsumi Masugata, Satoshi Iwatsubo, Mineo Asada
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Volume:
343-344
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(98)01678-2
File:
PDF, 357 KB
english, 1999
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