Formation of Si-based organic thin films with low...

Formation of Si-based organic thin films with low dielectric constant by using remote plasma enhanced chemical vapor deposition from hexamethyldisiloxane

Toshiaki Fujii, Mineo Hiramatsu, Masahito Nawata
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
343-344
Year:
1999
Language:
english
Pages:
4
DOI:
10.1016/s0040-6090(98)01693-9
File:
PDF, 349 KB
english, 1999
Conversion to is in progress
Conversion to is failed