Original and sputtering induced interface roughness in AES...

Original and sputtering induced interface roughness in AES sputter depth profiling of SiO2/Ta2O5 multilayers

A Rar, I Kojima, D.W Moon, S Hofmann
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Volume:
355-356
Year:
1999
Language:
english
Pages:
5
DOI:
10.1016/s0040-6090(99)00456-3
File:
PDF, 277 KB
english, 1999
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