Characterization of charging effect on 8″ wafer during...

Microelectronic Engineering 2003 Vol. 67-68; Iss. none

Characterization of charging effect on 8″ wafer during e-beam lithography exposure

V. Jaubert, P. Lucas, L. Mollard, S. Tedesco, B. Dal’zotto, S. Landis
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Volume:
67-68
Year:
2003
Language:
english
Pages:
8
DOI:
10.1016/s0167-9317(03)00065-0
File:
PDF, 427 KB
english, 2003
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