Dual pass electron beam writing of bit arrays with sub-100 nm bits on imprint lithography masters for patterned media production
Alexei L. Bogdanov, Tommy Holmqvist, Piotr Jedrasik, Bengt NilssonVolume:
67-68
Year:
2003
Language:
english
Pages:
9
DOI:
10.1016/s0167-9317(03)00093-5
File:
PDF, 1.21 MB
english, 2003