The behavior of interstitial oxygen atoms induced by F2...

The behavior of interstitial oxygen atoms induced by F2 laser irradiation of oxygen-rich glassy SiO2

L. Skuja, K. Kajihara, T. Kinoshita, M. Hirano, H. Hosono
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Volume:
191
Year:
2002
Language:
english
Pages:
4
DOI:
10.1016/s0168-583x(02)00525-6
File:
PDF, 101 KB
english, 2002
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