Sequential ion implantation of copper and cobalt in silica...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2002 Vol. 191; Iss. 1-4

Sequential ion implantation of copper and cobalt in silica glass: A study by synchrotron radiation techniques

E. Cattaruzza, F. D'Acapito, C. de Julian Fernandez, A. de Lorenzi, F. Gonella, G. Mattei, C. Maurizio, P. Mazzoldi, S. Padovani, B.F. Scremin, F. Zontone
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Volume:
191
Year:
2002
Language:
english
Pages:
5
DOI:
10.1016/s0168-583x(02)00552-9
File:
PDF, 372 KB
english, 2002
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