Properties of thick DLC films prepared by plasma-based ion...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2003 Vol. 206; Iss. none

Properties of thick DLC films prepared by plasma-based ion implantation and deposition using combined RF and H.V. pulses

Y. Oka, M. Tao, Y. Nishimura, K. Azuma, E. Fujiwara, M. Yatsuzuka
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Volume:
206
Year:
2003
Language:
english
Pages:
4
DOI:
10.1016/s0168-583x(03)00833-4
File:
PDF, 252 KB
english, 2003
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