Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
1997 Vol. 132; Iss. 3
Deep light ion lithography in PMMA — A parameter study
F. Schrempel, W. WitthuhnVolume:
132
Year:
1997
Language:
english
Pages:
9
DOI:
10.1016/s0168-583x(97)00449-7
File:
PDF, 871 KB
english, 1997