Dose-rate dependence of negative copper ion implantation...

Dose-rate dependence of negative copper ion implantation into silica glasses and effects on colloid formation

N Kishimoto, V.T Gritsyna, Y Takeda, C.G Lee, T Saito
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Volume:
141
Year:
1998
Language:
english
Pages:
5
DOI:
10.1016/s0168-583x(98)00180-3
File:
PDF, 288 KB
english, 1998
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