Evidence for interstitial-type defects in the Rp/2 region...

Evidence for interstitial-type defects in the Rp/2 region of MeV-self-ion-implanted silicon produced by standard ion milling procedure

A Peeva, R Kögler, P Werner, A.A.D de Mattos, P.F.P Fichtner, M Behar, W Skorupa
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
161-163
Year:
2000
Language:
english
Pages:
5
DOI:
10.1016/s0168-583x(99)00992-1
File:
PDF, 165 KB
english, 2000
Conversion to is in progress
Conversion to is failed