Characteristics of a-si:h films prepared by ecr cvd as a...

Materials Chemistry and Physics 1997 Vol. 51; Iss. 2

Characteristics of a-si:h films prepared by ecr cvd as a function of the h2/sih4

Moonsang Kang, Jaeyeong Kim, Yongseo Koo, Taehoon Lim, Inhwan Oh, Bupju Jeon, Ilhyun Jung, Chul An
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Volume:
51
Year:
1997
Language:
english
Pages:
5
DOI:
10.1016/s0254-0584(97)80285-4
File:
PDF, 514 KB
english, 1997
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