Annealing behavior of defects introduced in SOI structure...

Annealing behavior of defects introduced in SOI structure by arsenic ion implantation (ESR and PAS studies)

Akinori Suzuki, Hideki Nakamura, Tomio Izumi, Takayuki Onda, Tohru Hara
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Volume:
54
Year:
1998
Language:
english
Pages:
4
DOI:
10.1016/s0254-0584(98)00017-0
File:
PDF, 483 KB
english, 1998
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