Silicon dioxide thin films prepared by ArF excimer laser chemical vapor deposition from silicon tetraacetate
Naoki Tanaka, Atsushi Maruyama, Ken Yukimura, Shinzo Yoshikado, Toshiro MaruyamaVolume:
54
Year:
1998
Language:
english
Pages:
4
DOI:
10.1016/s0254-0584(98)00082-0
File:
PDF, 358 KB
english, 1998