Silicon dioxide thin films prepared by ArF excimer laser...

Silicon dioxide thin films prepared by ArF excimer laser chemical vapor deposition from silicon tetraacetate

Naoki Tanaka, Atsushi Maruyama, Ken Yukimura, Shinzo Yoshikado, Toshiro Maruyama
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Volume:
54
Year:
1998
Language:
english
Pages:
4
DOI:
10.1016/s0254-0584(98)00082-0
File:
PDF, 358 KB
english, 1998
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