New ellipsometric approach to critical dimension metrology utilizing form birefringence inherent in a submicron line-and-space pattern
Seiji Takeuchi, Minoru Yoshii, Masaki YamamotoVolume:
21
Year:
1999
Language:
english
DOI:
10.1016/s0920-5489(99)92235-3
File:
PDF, 36 KB
english, 1999