Characteristics of CVD silicon oxide films: Effect of...

Heat Transfer - Asian Research 2004 Vol. 33; Iss. 2

Characteristics of CVD silicon oxide films: Effect of discharge form on formation and properties of films

Kazuhiro Ishimaru, Ken Okazaki
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Volume:
33
Year:
2004
Language:
english
Pages:
11
DOI:
10.1002/htj.20000
File:
PDF, 1.67 MB
english, 2004
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