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Study of nitrogen-rich silicon oxynitride films obtained by PECVD
D. Criado, I. Pereyra, M.I. AlayoVolume:
50
Year:
2003
Language:
english
Pages:
5
DOI:
10.1016/s1044-5803(03)00075-5
File:
PDF, 197 KB
english, 2003