Effect of HCl/O2 and O2 dry environments on the distribution of boron in oxide and silicon from thermally deposited boron
Kemhadjian, H., Mhango, G.M.Volume:
135
Year:
1988
Language:
english
DOI:
10.1049/ip-i-1.1988.0028
File:
PDF, 312 KB
english, 1988