Characteristics of silicon nitride after O/sub 2/ plasma...

IEEE Transactions on Biomedical Engineering 2001 Vol. 48; Iss. 3

Characteristics of silicon nitride after O/sub 2/ plasma surface treatment for pH-ISFET applications

Li-Te Yin, Jung-Chuan Chou, Wen-Yaw Chung, Tai-Ping Sun, Shen-Ken Hsiung
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Volume:
48
Year:
2001
Language:
english
Pages:
5
DOI:
10.1109/10.914797
File:
PDF, 124 KB
english, 2001
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