A 20-ps Si bipolar IC using advanced super self-aligned...

IEEE Transactions on Electron Devices 1989 Vol. 36; Iss. 7

A 20-ps Si bipolar IC using advanced super self-aligned process technology with collector ion implantation

Konaka, S., Yamamoto, E., Sakuma, K., Amemiya, Y., Sakai, T.
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Volume:
36
Year:
1989
Language:
english
Pages:
6
DOI:
10.1109/16.30943
File:
PDF, 608 KB
english, 1989
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