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Low-resistance self-aligned Ti-silicide technology for sub-quarter micron CMOS devices
Mogami, T., Wakabayashi, H., Saito, Y., Tatsumi, T., Matsuki, T., Kunio, T.Volume:
43
Year:
1996
Language:
english
Pages:
8
DOI:
10.1109/16.502126
File:
PDF, 903 KB
english, 1996