A model for thermal growth of ultrathin silicon dioxide in...

A model for thermal growth of ultrathin silicon dioxide in O2 ambient: a rate equation approach

Gorantla, S., Muthuvenkatraman, S., Venkat, R.
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Volume:
45
Year:
1998
Language:
english
Pages:
3
DOI:
10.1109/16.658853
File:
PDF, 96 KB
english, 1998
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