Characterization of various stress-induced oxide traps in...

IEEE Transactions on Electron Devices 1998 Vol. 45; Iss. 8

Characterization of various stress-induced oxide traps in MOSFET's by using a subthreshold transient current technique

Tahui Wang, Lu-Ping Chiang, Nian-Kai Zous, Tse-En Chang, Chimoon Huang
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Volume:
45
Year:
1998
Language:
english
Pages:
6
DOI:
10.1109/16.704380
File:
PDF, 180 KB
english, 1998
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