Silicide application on gated single-crystal,...

IEEE Transactions on Electron Devices 2001 Vol. 48; Iss. 1

Silicide application on gated single-crystal, polycrystalline and amorphous silicon FEAs. II. Co silicide

Jong Duk Lee, Byung Chang Shim, Byung Gook Park
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Volume:
48
Year:
2001
Language:
english
Pages:
6
DOI:
10.1109/16.892183
File:
PDF, 181 KB
english, 2001
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