The effects of fluorine on parametrics and reliability in a 0.18-μm 3.5/6.8 nm dual gate oxide CMOS technology
Hook, T.B., Adler, E., Guarin, F., Lukaitis, J., Rovedo, N., Schruefer, K.Volume:
48
Year:
2001
Language:
english
Pages:
8
DOI:
10.1109/16.930650
File:
PDF, 124 KB
english, 2001