A novel double ion-implant (DII) Ti-salicide technology for...

IEEE Transactions on Electron Devices 2001 Vol. 48; Iss. 8

A novel double ion-implant (DII) Ti-salicide technology for high-performance sub-0.25-μm CMOS devices applications

Kong-Beng Thei, Wen-Chau Liu, Hung-Ming Chuang, Kun-Wei Lin, Chin-Chuan Cheng, Chin-Hsiung Ho, Chi-Wen Su, Shou-Gwo Wuu, Chung-Shu Wang
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Volume:
48
Year:
2001
Language:
english
Pages:
3
DOI:
10.1109/16.936697
File:
PDF, 97 KB
english, 2001
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