Properties of inductively coupled plasma source with...

IEEE Transactions on Plasma Science 2000 Vol. 28; Iss. 2

Properties of inductively coupled plasma source with helical coil

Jong-Chui Park, Jae Koo Lee, Bongkoo Kang
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Volume:
28
Year:
2000
Language:
english
Pages:
11
DOI:
10.1109/27.848099
File:
PDF, 334 KB
english, 2000
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