Low-temperature deposition of hafnium silicate gate dielectrics
Punchaipetch, P., Pant, G., Quevedo-Lopez, M.A., Yao, C., El-Bouanani, M., Kim, M.J., Wallace, R.M., Gnade, B.E.Volume:
10
Year:
2004
Language:
english
Pages:
12
DOI:
10.1109/jstqe.2004.824109
File:
PDF, 675 KB
english, 2004