An Ultralow-Resistance Ultrashallow Metallic Source/Drain Contact Scheme for III–V NMOS
Oxland, R., Chang, S.W., Xu Li, Wang, S.W., Radhakrishnan, G., Priyantha, W., van Dal, M.J.H., Hsieh, C.H., Vellianitis, G., Doornbos, G., Bhuwalka, K., Duriez, B., Thayne, I., Droopad, R., Passlack,Volume:
33
Year:
2012
Language:
english
Pages:
3
DOI:
10.1109/led.2012.2185919
File:
PDF, 337 KB
english, 2012