Turning silicon on its edge [double gate CMOS/FinFET...

IEEE Circuits and Devices Magazine 2004 Vol. 20; Iss. 1

Turning silicon on its edge [double gate CMOS/FinFET technology]

Nowak, E.J., Aller, I., Ludwig, T., Kim, K., Joshi, R.V., Ching-Te Chuang, Bernstein, K., Puri, R.
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Volume:
20
Year:
2004
Language:
english
Pages:
12
DOI:
10.1109/mcd.2004.1263404
File:
PDF, 1.77 MB
english, 2004
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