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A general simulator for VLSI lithography and etching processes: Part I—Application to projection lithography
Oldham, W.G., Nandgaonkar, S.N., Neureuther, A.R., O'Toole, M.Volume:
26
Year:
1979
Language:
english
Pages:
6
DOI:
10.1109/t-ed.1979.19482
File:
PDF, 791 KB
english, 1979