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Azide-phenolic resin photoresists for deep UV lithography
Iwayanagi, T., Kohashi, T., Nonogaki, S., Matsuzawa, T., Douta, K., Yanazawa, H.Volume:
28
Year:
1981
Language:
english
Pages:
5
DOI:
10.1109/t-ed.1981.20605
File:
PDF, 805 KB
english, 1981