A multiple-electron-beam exposure system for high-throughput, direct-write submicrometer lithography
Brodie, I., Westerberg, E.R., Cone, D.R., Muray, J.J., Williams, N., Gasiorek, L.Volume:
28
Year:
1981
Language:
english
Pages:
7
DOI:
10.1109/t-ed.1981.20625
File:
PDF, 893 KB
english, 1981