Boron diffusion in silicon

IEEE Transactions on Electron Devices 1985 Vol. 32; Iss. 11

Boron diffusion in silicon

Marchiando, J.F., Roitman, P., Albers, J.
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Volume:
32
Year:
1985
Language:
english
Pages:
9
DOI:
10.1109/t-ed.1985.22278
File:
PDF, 1000 KB
english, 1985
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