HAADF and EELS Study of ULK Dielectrics : Impact of CMP on...

Imaging & Microscopy 2009 Vol. 11; Iss. 1

HAADF and EELS Study of ULK Dielectrics : Impact of CMP on Microstructure and Electronic Properties

Marie Cheynet, Fabien Volpi, Simone Pokrant, Roland Pantel, Mohammed Aimadedinne, Vincent Arnal
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Volume:
11
Year:
2009
Language:
english
Pages:
3
DOI:
10.1002/imic.200990017
File:
PDF, 616 KB
english, 2009
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