Self-aligned nickel, cobalt/tantalum nitride stacked-gate pMOSFETs fabricated with a low temperature process after metal electrode deposition
Pan, J., Woo, C., Ngo, M.-V., Chih-Yuh Yang, Besser, P., King, P., Bernard, J., Adem, E., Tracy, B., Pellerin, J., Qi Xiang, Ming-Ren LinVolume:
50
Year:
2003
Language:
english
Pages:
5
DOI:
10.1109/ted.2003.819434
File:
PDF, 591 KB
english, 2003