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Performance and reliability of low-temperature polysilicon TFT with a novel stack gate dielectric and stack optimization using PECVD nitrous oxide plasma
Kow-Ming Chang, Wen-Chih Yang, Chiu-Pao TsaiVolume:
51
Year:
2004
Language:
english
Pages:
5
DOI:
10.1109/ted.2003.820791
File:
PDF, 479 KB
english, 2004