Highly reliable MIS capacitors with plasma nitridation and...

IEEE Transactions on Electron Devices 2005 Vol. 52; Iss. 8

Highly reliable MIS capacitors with plasma nitridation and doubled dielectric-constant tantalum pentoxide

Miki, H., Shimamoto, Y., Furukawa, R.
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Volume:
52
Year:
2005
Language:
english
Pages:
7
DOI:
10.1109/ted.2005.852725
File:
PDF, 326 KB
english, 2005
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