Fundamentals of silicon material properties for successful...

IEEE Transactions on Electron Devices 2006 Vol. 53; Iss. 5

Fundamentals of silicon material properties for successful exploitation of strain engineering in modern CMOS manufacturing

Chidambaram, P.R., Bowen, C., Chakravarthi, S., Machala, C., Wise, R.
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Volume:
53
Year:
2006
Language:
english
Pages:
21
DOI:
10.1109/ted.2006.872912
File:
PDF, 716 KB
english, 2006
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