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Process and Characteristics of Fully Silicided Source/Drain (FSD) Thin-Film Transistors
Chia-Pin Lin, Yi-Hsuan Hsiao, Bing-Yue TsuiVolume:
53
Year:
2006
Language:
english
Pages:
9
DOI:
10.1109/ted.2006.885651
File:
PDF, 859 KB
english, 2006