High-κ Metal Gate MOSFETs: Impact of Extrinsic Process...

IEEE Transactions on Electron Devices 2007 Vol. 54; Iss. 3

High-κ Metal Gate MOSFETs: Impact of Extrinsic Process Condition on the Gate-Stack Quality—A Mobility Study

Trojman, L., Ragnarsson, L.-A., O'Sullivan, B.J., Rosmeulen, M., Kaushik, V.S., Groeseneken, G.V., Maes, H.E., De Gendt, S., Heyns, M.
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Volume:
54
Year:
2007
Language:
english
Pages:
7
DOI:
10.1109/ted.2006.890230
File:
PDF, 296 KB
english, 2007
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