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Effect of Nitrogen Profile and Fluorine Incorporation on Negative-Bias Temperature Instability of Ultrathin Plasma-Nitrided SiON MOSFETs
Terai, M., Watanabe, K., Fujieda, S.Volume:
54
Year:
2007
Language:
english
Pages:
8
DOI:
10.1109/ted.2007.899432
File:
PDF, 293 KB
english, 2007