Electrical and Interfacial Characterization of Atomic Layer Deposited High- κ Gate Dielectrics on GaAs for Advanced CMOS Devices
Dalapati, G.K., Yi Tong, Wei-Yip Loh, Hoe Keat Mun, Byung Jin ChoVolume:
54
Year:
2007
Language:
english
Pages:
7
DOI:
10.1109/ted.2007.901261
File:
PDF, 271 KB
english, 2007