Strained Si/SiGe Channel With Buried for Improved...

IEEE Transactions on Electron Devices 2007 Vol. 54; Iss. 12

Strained Si/SiGe Channel With Buried for Improved Drivability, Gate Stack Integrity and Noise Performance

Wei-Yip Loh, Hui Zang, Hoon-Jung Oh, Kyu-Jin Choi, Hoai Son Nguyen, Guo-Qiang Lo, Byung Jin Cho
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Volume:
54
Year:
2007
Language:
english
Pages:
7
DOI:
10.1109/ted.2007.908599
File:
PDF, 437 KB
english, 2007
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