The Impact of Nitrogen Engineering in Silicon Oxynitride...

The Impact of Nitrogen Engineering in Silicon Oxynitride Gate Dielectric on Negative-Bias Temperature Instability of p-MOSFETs: A Study by Ultrafast On-The-Fly Technique

Maheta, V.D., Olsen, C., Ahmed, K., Souvik Mahapatra
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
55
Year:
2008
Language:
english
Pages:
9
DOI:
10.1109/ted.2008.923524
File:
PDF, 473 KB
english, 2008
Conversion to is in progress
Conversion to is failed