The Impact of Nitrogen Engineering in Silicon Oxynitride Gate Dielectric on Negative-Bias Temperature Instability of p-MOSFETs: A Study by Ultrafast On-The-Fly Technique
Maheta, V.D., Olsen, C., Ahmed, K., Souvik MahapatraVolume:
55
Year:
2008
Language:
english
Pages:
9
DOI:
10.1109/ted.2008.923524
File:
PDF, 473 KB
english, 2008