Contact Technology for Strained nFinFETs With Silicon–Carbon Source/Drain Stressors Featuring Sulfur Implant and Segregation
Shao-Ming Koh, Samudra, G.S., Yee-Chia YeoVolume:
59
Year:
2012
Language:
english
Pages:
10
DOI:
10.1109/ted.2012.2185799
File:
PDF, 964 KB
english, 2012